Sputtered Nano-ceramic Film
SPUTTERED NANO CERAMIC FILM is produced in a special vacuum chamber by high-tech controlled sputtering equipment. The electromagnetic fields propel ions towards the high-purity metal in electrically charged gases. This blast of ions dislodges groups of atoms in short bursts and spreads them evenly and finely across the film’s surface.
IRR 97%
UVR 99.9%
THICKNESS 2/4mil
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