Combustion-type exhaust abatement system that offers highly efficient treatment of flammable gases and perfluorocarbons (PFCs)
Model | Unit | G5-350 A1~A4/P1~P4 | G5-500 A1~A4/P1~P4 | G5-600 A1~A4/P1~P4 | G5-1200 A1~A4/P1~P4 |
Abatement method | burn+ wet | burn+ wet | burn+ wet | burn+ wet | |
Max. inflow gas volume | L/min | 350 | 500 | 600 | 1200 |
Fuel | City gas or propane gas | City gas or propane gas | City gas or propane gas | City gas or propane gas | |
Dimensions | W x D x H mm | 1,200 x 650 x 1,900 | 1,200 x 650 x 1,900 | 1,200 x 1,100 x 2,000 | 1,200 x 1,100 x 2,200 |
Gases (e.g.) | Process (depo) gases Cleaning gases, including SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2 NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. PFCs CF4, C2F6, C3F8, CHF3, SF6, etc. |
Process (depo) gases Cleaning gases, including SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2 NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. PFCs CF4, C2F6, C3F8, CHF3, SF6, etc. |
Process (depo) gases SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2 Cleaning gases - all types NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. PFCs CF4, C2F6, C3F8, CHF3, SF6, etc. |
Process (depo) gases SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2 Cleaning gases - all types NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. PFCs CF4, C2F6, C3F8, CHF3, SF6, etc. |
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Standard equipment | Burner scraper for powder removal | Burner scraper for powder removal | Burner scraper for powder removal | Burner scraper for powder removal | |
Options | City water/drainage consumption reduction unit | City water/drainage consumption reduction unit | City water/drainage consumption reduction unit | City water/drainage consumption reduction unit |